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OEBR System
- EBR with UV Light Source
- EBR Width : 0.5 ~ 3.0mm Exposure
- Round Mode / Partial Mode
- Stand Alone Type / Unite Type
Model Name
FASH-2003L
Substrate Size
- 8-Inch, 12-Inch
Substrate Material
- Flat Wafer, Notch Wafer
Wave Length
- 248nm ~ 400nm
Resist
- Deep UV, i-Line
Cassette Station
- Uni-Cassette : 2ea
Module
Align Module
- Align within 1mm
Transfer Module
- 2-Arm Vac Robot with mapping sensor
- 4-Axis (R1, R2, T, Z)
Exposure Length
- 0.5mm ~ 10mm
- unit 0.1mm
Accuracy
- ±100um
Exposure mode
- Round mode, Flat mode, Partial Mode
Light source
- 200W Mercury-Xenon UV Lamp
UV lamp lift time
- Average 3,000h
Lamp intensity
- 1000mW/cm2, 4000mW/cm2
Option
- UV Filter
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