Track System
- Maximized Throughput
- Easy Main tenance
- Multiple Process
- Faster Delivery
- Built-In Chemical Supply System
Model Name
DAVID SYSTEM
Substrate Size
- 2"~3", 3"~4", 4"~6", 6"~8",12"
- Flat / Notch
Substrate Material
- Si, Sapphire,GsAs, Glass
Module
Transfer Unit
- 2-Arm Vac Robot sith mapping sensor
- 5-Axis ( R1,R2,T,Z,X )
Coater Module
- PR 3-Nozzle, RRC, Top Rinse, Back Rince
Max 7000rpm
- Pump : motor or bellow
Develper Module
- DEV 2-Nozzle, Top Rinse , Back Rinse
Max 7000rpm
- N2-Pressure
Adhesion Module
- HMDS Vapor, 50℃ ~180℃ ±1.5℃
- N2-Bubbling
Hot Plate Module
- PID Temperature Controller
50℃ ~180℃ ±1.5℃
- Unit 0.01℃
Cool Plate Module
- Thermo-Module Controller
15℃ ~30℃ ±0.5℃
- Unit 0.01℃
Align Module
-Align within 1mm
System Configuration
- 2-Spin, 3-Spin, 4-Spin,5-Spin
- Coater / Developer
Demension
- W1420 x D1875 x H1960
- Under 8 Inch
Cassette Station
- Uni-Cassette : 2ea
- Auto-Conversion
